Study of the structure of Mo-based coatings on silicon substrates for thin-film IR emitters

The work studies the structure of a coating based on Mo/silicon substrate radiation using a combination of ion-assisted and magnetron deposition in various modes. It is shown that the surface of the coating has a structural composition and demonstrates radiation-stimulated diffusion of molybdenum into the depth of the substrate with a concentration of up to 1 at%, to a depth of up to 500 nm. The resulting coatings have stable resistive and thermoelectric properties and a wind roughness of no more than 2.5. nm in conditions of 10x10 nm and provide strength properties and density. The hardness of the coatings, obtained by interpreting the indentation results, is up to 70 GPa and controlled wettability, obtained by interpreting the indentation results, which makes it possible to subsequently form protective or electronic layers from them, makes it possible to form thin-film IR emitters based on MoSi2 from them, which is extremely important. when creating optical gas analyzers. built on the principle of dispersive-free IR spectroscopy.